Park NX20 300mm
可用于 300mm晶片圆测量和分析的高端自动化纳米测量工具
Park NX20 300mm是业界创新型大样品原子力显微镜，支持300mm×300mm全程机动化。新升级的Park NX20系统专为失效分析和质量控制实验室设计，可有效地检测整个300mm晶圆，且无需任何繁琐的样品位移。尽管扩大了支持300mm样品的机动XY工作台，但Park的创新性振动隔离技术仍然能够将系统噪声保持在低于0.5 (Å) RMS，通常是0.3 Å RMS的水平。
专为大样品晶圆检测而建
NX20 300 mm进行了全新设计，可达到大样品的高精度测量。整个300mm晶圆区域可进行低噪声原子力显微镜测量分析。这开启了一个全新的自动化测量范围，让工程师可以更快捷、更简便、更精准地开展工作。
灵活的300mm样品吸盘
Park NX20 300mm真空吸盘支持各种尺寸、形状和类型的晶圆，让用户几乎可准确扫描任何样品。
300mm XY轴工作台
机动化的300mm XY轴工作台允许用户在300mm的全部区域内移动原子力显微镜的测量位置。
NX20 支持300mm样品台，性能已被证实
因其便捷的易用性和自动化以及不受影响的精度，NX20已是FA、QA和QC工程师的理想选择。凭借其支持300mm电动XY轴工作台的扩大平台，NX20 300mm更上一层楼，允许用户轻松地以较高的精度检测更大的样品。
Park SmartScan™让精准测量更为简单
Park NX20配备了我们的SmartScan操作系统，是市场上易使用的原子力显微镜。通过直观且强大的界面，即便是未经培训的用户无需协助也可快速扫描大样品。这使高级工程师能够集中精力解决更大的问题和开发更好的解决方案。
a在完整300mm晶圆上扫描多个位点
SmartScan™允许用户从位点到位点和样品到样品的层面上，借助基于网格和晶圆的模式，进行自动顺序测量与表面形态、高度和表面粗糙度的比较。这可以大大提高扫描大样品时的用户便利性和生产效率。
b强大的工作创建功能
格式创建流程简单，允许工程师设置每个批次的位置、名称、数量和类型所定义的预设。
针对广泛应用性进行优化
NX20 300mm为众多应用提供自动格式的原子力显微镜测量，为纳米级的样品提供精准测量和分析。具有粗糙度、高度和深度测量，缺陷检查，电气和磁故障分析，热性能表征和纳米力学性能成像等能力，该原子力显微镜是检测大样品的FA、QA和QC工程师执行各种任务的理想选择。
Park NX20 300mm Specifications
Scanner
Z Scanner
Guided high-force flexure scanner
Scan range : 15 µm (optional 30 µm)
Height noise level : 30 pm
0.5 kHz bandwidth, rms (typical)
XY Scanner
Single module flexure XY-scanner with dual servo closed-loop control
Scan range : 100 µm × 100 µm
Stage
Z stage range : 25 mm (Motorized)
Focus travel range : 8 mm (Motorized)
XY stage travel range : 300 mm x 300 mm (Motorized)
Sample Mount
Sample size : 100, 150, 200, 300 mm wafers, small sample Magnetic sample holder, thickness up to 20 mm
Sample weight : < 500 g
Optics
10x (0.23 NA) ultra-long working distance lens (1 µm resolution)
Direct on-axis vision of sample surface and cantilever
Field-of-view : 840 × 630 µm (with 10× objective lens)
CCD : 5 M pixel
Software
SmartScan™
Dedicated system control and data acquisition software
Auto mode, Manual mode
Program mode for recipe-automated, sequential multiple-site measurement AFM operation
XEI
AFM data analysis software
Electronics
Integrated functions
4 channels of flexible digital lock-in amplifier
Digital Q control
Signal processing
- ADC : 18 channels 4 high-speed ADC channels 24-bit ADCs for X, Y and Z scanner position sensor
- DAC : 17 channels 2 high-speed DAC channels 20-bit DACs for X, Y and Z scanner positioning
- Maximum data size : 4096 x 4096 pixels
External signal access
20 embedded signal input/output ports
5 TTL outputs : EOF, EOL, EOP, Modulation, and AC bias
AFM Modes
(*Optionally available)
Standard Imaging
True Non-Contact AFM
PinPoint™ AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Tapping AFM
Force Measurement
Force Distance (F/d) Spectroscopy
Force Volume Imaging
Dielectric/Piezoelectric Properties
Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoresponse Force Microscopy (PFM)
PFM with High Voltage*
Mechanical Properties
Force Modulation Microscopy (FMM)
Nanoindentation*
Nanolithography*
Nanolithography with High Voltage*
Nanomanipulation*
Magnetic Properties*
Magnetic Force Microscopy (MFM)
Tunable Magnetic Field MFM
Electrical Properties
Conductive AFM (C-AFM)*
IV Spectroscopy*
Kelvin Probe Force Microscopy (KPFM)
Scanning Capacitance Microscopy (SCM)*
Scanning Spreading-Resistance Microscopy (SSRM)*
Scanning Tunneling Microscopy (STM)*
Photo Current Mapping (PCM)*
Chemical Properties*
Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-AFM)
AFM Options
Customize your AFM to handle any project
Active Temperature Controlled Acoustic Enclosure
Innovative control design allows Park NX20 300mm to quickly reach temperature equilibrium Park NX20 300mm also features active vibration isolation.
Innovative control design allows Park NX20 300mm to quickly reach temperature equilibrium Park NX20 300mm also features active vibration isolation.
Encoders for Motorized Stage
• The encoded XY stage travels in 1 µm resolution with 2 µm repeatability
• The encoded Z stage travels in 0.1 µm resolution with 1 µm repeatability
• Dedicated small sample holder for electrical measurements
• Vacuum grooves to hold wafers
Temperature Control
· Temperature Controlled Stage 1: -25 °C to +170 °C
· Temperature Controlled Stage 2: Ambient to +250 °C
· Temperature Controlled Stage 3: Ambient to +600 °C