Park NX-Hybrid WLI
Industry’s leading dual instruments for multi-scale metrology solutions
Park NX-Hybrid WLI is a multi-scale metrology system integrating AFM and White Light Interferometry (WLI) within a single platform. It combines high-throughput, large-area WLI imaging with sub-nanometer-precision AFM measurement for comprehensive surface characterization. Leveraging Park’s proven AFM technology, the NX-Hybrid WLI enhances WLI performance using the AFM Z-scanner for optical height scanning, enabling precise optical control and seamless image stitching. A motorized dual-objective turret enables efficient switching between wide field-of-view and high-resolution imaging modes. Reliable sub-nanometer measurement is ensured by advanced AFM technologies, including a decoupled XY scan system, independent dual-servo XY control, a high-resonance-frequency Z scanner, and True Non-contact™ operation for extended probe lifetime.
Key Features
Integrated AFM–WLI Metrology Platform
The NX-Hybrid WLI seamlessly integrates an automated industrial AFM system and a WLI profilometer on a single platform, replacing conventional two-tool solutions while reducing cost and tool footprint. It combines AFM and WLI into a unified workflow, enabling seamless switching between measurement modes within a single recipe depending on application requirements. The NX-Hybrid WLI supports fully automated operation from wafer handling to measurement and analysis, including automatic recipe execution, tip selection, multi-site scanning, data analysis, and report generation.
Automated Wafer Handling Capability
Wafer transfer is performed automatically by an equipment front-end module (EFEM). It uses robotic mechanisms, sensors, and algorithms to ensure precise alignment and reliable handling of various materials, including warped wafers. The N₂ purge load port is available as an option.
Automatic Probe Exchange
The automatic tip exchanger seamlessly replaces the probe when a threshold is exceeded. It can store up to 24 pre-mounted probes (12 probes per cassette).
Integrated AFM–WLI Software Platform
XEA software integrates AFM and WLI measurement and analysis into a single automated workflow, enabling seamless mode switching within a single recipe. It offers practical features such as easy recipe copy and paste, specialized editing modes, and real-time recipe updates. Built-in functions support comprehensive system operations, including parameter adjustment, database management, and maintenance, while maintaining an intuitive and user-friendly interface. The navigator provides an intuitive user interface that integrates system adjustment and operation.
Fab Host Communication via SECS/GEM Protocol
The NX-Hybrid WLI enables Fab host communication via the SECS/GEM protocol, ensuring full compliance with SEMI standards, including E30, E40, E87, E90, E94, and E84 PI/O for AMHS integration.
Fab Compatibility According to SEMI Standards
The NX-Hybrid WLI ensures optimal compatibility with cleanroom environments in semiconductor fabs. The system achieves ISO Cleanliness Class 1 (≤10 particles/m³ ≥ 0.1 µm and ≤2 particles/m³ ≥ 0.2 µm) and minimizes particle contamination along the wafer movement path through its engineered fan filter unit and ventilation system, while maintaining efficient noise shielding. Additional chemical filters are available as options to effectively block airborne molecular contamination (AMC), which can adversely affect sensitive samples. Furthermore, the system is equipped with advanced monitoring capabilities that can detect and alert users to potential fire hazards or voltage sags.
Park AFM Technology
Orthogonal Scan System
The separated flexure-guided 2D XY scanner and 1D Z scanner system minimizes out-of-plane motion by eliminating crosstalk between horizontal and vertical motion. The independent Z scanner enables precise, linear, and fast dynamic performance.
The XY scanner features a dual-servo architecture with two pairs of actuators and position sensors mounted on opposite sides of each axis, providing
precise orthogonality and accurate positioning across the entire scan area.
Park AFM Technology
True Non-Contact™ Mode
True Non-contact™ mode, a proprietary technology offered by Park Systems, obtains topography by detecting the attractive van der Waals force between the tip and sample surface. The key advantage of True Non-contact mode is the prevention of tip wear and sample damage, ensuring consistent results with superior data reliability. This also reduces the total cost of ownership by extending tip life.
Park AFM Technology
Advanced WLI Technologies
Dual interferometry modes: WLI and PSI
NX-Hybrid WLI supports both WLI and PSI modes, covering a wide Z range from sub-nanometer to tens of micrometers.
Seamless Multi-Scale Measurement from WLI to AFM
The NX-Hybrid WLI combines the speed of WLI with the nanoscale precision of AFM in a single platform. This integration enables efficient large-area measurements with WLI and detailed surface analysis with AFM, significantly reducing total measurement time while maintaining accuracy.
Advanced Optical Interferometry and Large-Area Measurement
The system integrates dual-mode interferometry (WLI and PSI), supporting a wide Z measurement range from sub-nanometer to tens of micrometers. A motorized linear lens changer enables automatic switching between two objective lenses from a range of 2.5×, 10×, 20×, 50×, and 100×, allowing flexible measurement configurations for various inspection requirements and improved throughput. In addition, automatic stitching precisely aligns adjacent images during large-area scans, minimizing overlap errors and distortion while reducing the need for manual realignment.
